Handbook Of Plasma Processing Technology Book

Techniques for IC Processing Introduction to Plasma Concepts and Discharge Configurations Fundamentals of Sputtering and Reflection Bombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and Halides RF Diode Sputter Etching and Deposition Magnetron Plasma Deposition Processes Broad-Beam Ion Source Reactive Ion Etching Reactive Sputter Deposition Plasma Enhanced Chemical Vapor Deposition of Thin Films for Microelectronics Electron Cyclotron Resonance Microwave Discharges for Etching and Thin Film Deposition Hollow Cathode Etching and Deposition Ion Plating Ionized Cluster Beam (ICB) Deposition Techniques The Activated Reactive Evaporation (ARE) Process Formation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)
Selective Bias Sputter Deposition Vacuum Arc-Based Processing Ion Source Interactions: General Understandings Ion Assisted Deposition Microstructural Control of Plasma-Sputtered Refractory Coatings