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Book Categories |
Plasma Physics | ||
Pt. A1 | Introduction to Plasma Science | |
I | What is a plasma? | 1 |
II | Plasma fundamentals | 3 |
Pt. A2 | Introduction to Gas Discharges | |
III | Gas discharge fundamentals | 11 |
Pt. A3 | Plasma Sources I | |
IV | Introduction to plasma sources | 25 |
Pt. A4 | Plasma Sources II | |
V | RIE discharges | 31 |
Pt. A5 | Plasma Sources III | |
VI | ECR sources | 47 |
VII | Inductively coupled plasmas (ICPs) | 49 |
Pt. A6 | Plasma Sources IV | |
VIII | Helicon wave sources and HDPs | 61 |
IX | Discharge equilibrium | 69 |
Pt. A7 | Plasma Diagnostics | |
X | Introduction | 75 |
XI | Remote diagnostics | 75 |
XII | Langmuir probes | 79 |
XIII | Other local diagnostics | 93 |
Plasma Chemistry | ||
Pt. B1 | Overview of Plasma Processing in Microelectronics Fabrication | |
I | Plasma processing | 99 |
II | Applications in Microelectronics | 100 |
Pt. B2 | Kinetic Theory and Collisions | |
I | Kinetic theory | 103 |
II | Practical gas kinetic models and macroscopic properties | 109 |
III | Collision dynamics | 119 |
Pt. B3 | Atomic Collisions and Spectra | |
I | Atomic energy levels | 125 |
II | Atomic collisions | 126 |
III | Elastic collisions | 129 |
IV | Inelastic collisions | 130 |
Pt. B4 | Molecular Collisions and Spectra | |
I | Molecular energy levels | 137 |
II | Selection rule for optical emission of molecules | 139 |
III | Electron collisions with molecules | 140 |
IV | Heavy particle collisions | 142 |
V | Gas phase kinetics | 143 |
Pt. B5 | Plasma Diagnostics | |
I | Optical emission spectroscopy | 151 |
II | Laser induced fluorescence | 161 |
III | Laser interferometry | 162 |
IV | Full-wafer interferometry | 163 |
V | Mass spectrometry | 164 |
Pt. B6 | Plasma Surface Kinetics | |
I | Plasma chemistry | 167 |
II | Surface reactions | 167 |
III | Loading | 177 |
IV | Selectivity | 178 |
V | Detailed reaction modeling | 179 |
Pt. B7 | Feature Evolution and Modeling | |
I | Fundamentals of feature evolution in plasma etching | 183 |
II | Predictive modeling | 185 |
III | Mechanisms of profile evolution | 186 |
IV | Profile simulation | 190 |
V | Plasma damage | 193 |
Epilogue: Current Problems in Semiconductor Processing | 199 |
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Add Lecture Notes on Principles of Plasma Processing, Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with, Lecture Notes on Principles of Plasma Processing to the inventory that you are selling on WonderClubX
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Add Lecture Notes on Principles of Plasma Processing, Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with, Lecture Notes on Principles of Plasma Processing to your collection on WonderClub |