The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2, Vol. 2 Book

I	Thermal Oxidation Mechanisms and Modeling
	Introduction	1
	Silicon Oxides and Oxidation	3
	Use of [superscript 18]O Labelling to Study Growth Mechanisms in Dry Oxidation of Silicon	7
	Strain Dependent Diffusion During Dry Thermal Oxidation of Crystalline Si	15
	Oxidation of Silicon in Oxygen: Measurement of Film Thickness and Kinetics	23
	Modeling Process-Dependent Thermal Silicon Dioxide (SiO[subscript 2]) Films on Silicon	31
II	Novel Oxidation Methods and Characterization
	Introduction	43
	New Approach to Chemically Enhanced Oxidation - A Review	45
	Kinetics of Oxidation of Silicon by Electron Cyclotron Resonance Plasmas	55
	Mechanisms of Oxidation Rate Enhancement in Negative-Point Oxygen Corona Discharge Processing of SiO[subscript 2] Films on Si	63
	High Pressure Oxidation for Low Temperature Passivation of Si[subscript 1-x]Ge[subscript x] Alloys	71
	A New Ellipsometry Technique for Interface Analysis: Application to Si-SiO[subscript 2]	81
	Observation of Thin SiO[subscript 2] Films Using IR-RAS	91
	Deconvolution of Thickness-Averaged Structural and Optical Properties of Thermally Grown and RPECVD SiO[subscript 2] Films	99
	TEM Investigations of the Oxidation Kinetics of Amorphous Silicon Films	109
III	Deposition and Properties of SiO[subscript 2]
	Introduction	117
	Thermal and X-Ray Production of Point Defects in Vitreous SiO[subscript 2]	119
	A Review of the EPR Spectroscopy of the Point Defects in [alpha]-Quartz: The Decade 1982-1992	131
	Formation of Si/SiO[subscript 2] Heterostructures by Low-Temperature, Plasma-Assisted Oxidation and Deposition Processes	145
	Comparison and SiO[subscript 2] Thin Film Properties Deposited by Distributed Electron Cyclotron Resonance Plasma Using Two Different Oxidant Gases: N[subscript 2]O or O[subscript 2]	157
	Low Temperature Synthesis and Characterization of Silicon Dioxide Films	165
IV	Chemical Properties of Si Surfaces Related to Oxidation and Oxide Deposition
	Introduction	175
	Native Oxide Growth and Hydrogen Bonding Features on Chemically Cleaned Silicon Surfaces	177
	Understanding the Surface Chemical and Structural Implications of HF Solution Cleaning of Silicon	187
	Pre-Gate Oxide Si Surface Control	199
	Chemical Structures of Native Oxides Formed During Wet Chemical Treatments on NH[subscript 4]F Treated Si(111) Surfaces	207
	Silicon Surface Analysis and Very Thin Silicon Oxide Characterization after HF/Ethanol Preoxidation Silicon Cleaning	215
	Effects of Metallic Impurities Upon Thin Gate Oxide Integrity and Related Bulk Properties in CZ Si	223
V	Chemical, Structural, and Microroughness Effects at the Si-SiO[subscript 2] Interface
	Introduction	235
	Local Bonding at SiO[subscript 2]/Si Interfaces	237
	High-Resolution Transmission Electron Microscope Image of the SiO[subscript 2]/(001)Si Interface	247
	Dependence of Surface Microroughness on Types of Silicon Substrates	257
	The Effect of Surface Roughness on Gate Oxide Leakage Currents	267
	A Double Sacrificial Oxide Process for Smoother 150 [actual symbol not reproducible] SiO[subscript 2] Gate Oxide Interfaces	273
	Effect of Solidification Induced Defects in CZ-Silicon Upon Thin Gate Oxide Integrity	279
	Effects of D-Defects in CZ Silicon Upon Thin Gate Oxide Integrity	289
	Oxidation Induced Changes in the Si Surface Microroughness	299
VI	Novel Structures, Processes, and Phenomena
	Introduction	307
	Properties of Simox and Related Systems	309
	Reoxidized Nitrided Oxide Gate Dielectrics for Advanced CMOS	319
	Interface Properties and Device Reliability of High Quality PECVD Oxide for MOS Applications	329
	Charge Trapping in an Oxide-Nitride-Oxide Gate Dielectric	337
	Interface Trap Density Reduction and Oxide Profiling for MOS Capacitors with Fluorinated Gate Oxide Dielectrics	345
	Physics of Extreme Quantum Confinement Exemplified by Si/SiO[subscript 2] System	353
	The Integrity of Very Thin Silicon Films Deposited on SiO[subscript 2]	357
	Researches of SiO[subscript 2] on InP and GaAs MOS Structures	363
VII	Defects and Hot-Carrier Induced Damage in Si-SiO[subscript 2] Systems
	Introduction	371
	Generation of Random Telegraph Noise by Single Si/SiO[subscript 2] Interfacial Defects	373
	Single Electron Transfer from the Channel of a Sub-[mu]m MOSFET to an Individual Interface Trap	383
	Defect Structure and Generation Mechanisms at the Si/SiO[subscript 2] Interface	393
	The Influence of Crystal Orientation and Processing Conditions on the Energy Distribution of Traps at the Si-SiO[subscript 2] Interface	403
	Charge Trapping and Defect Generation in Thermal Oxide Layers	411
	Optically Induced Nitrogen Dangling Bonds in Amorphous Hydrogenated Silicon Nitride Thin Films	421
VIII	Radiation and Hydrogen Induced Effects in Silicon-Silicon Dioxide Systems
	Introduction	427
	Impact Ionization and Degradation in Silicon Dioxide Films on Silicon	429
	Hot-Electron Dynamics in Thin Silicon Dioxide Films Studied by Photon-Induced Electron Transmission	439
	Constant Current