|
|
Sold Out
Book Categories |
Polymers in Microlithography: An Overview Brönsted Acid Generation from Triphenylsulfonium Salts in Acid-Catalyzed Photoresist Films Chemically Amplified Resist: Effect of Polymer and Acid Generator Structure Copolymer Approach to Design of Sensitive Deep-UV Resist Systems with High Thermal Stability and Dry Etch Resistance Nonswelling Negative Resists Incorporating Chemical Amplification: Electrophilic Aromatic Substitution Approach Acid-Catalyzed Cross-Linking in Phenolic-Resin-Based Negative Resists New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals Polysilanes: Solution Photochemistry and Deep-UV Lithography Syntheses of Base-Soluble Si Polymers and Their Application to Resists Lithographic Evaluation of Phenolic Resin-Dimethyl Soloxane Block Copolymers Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process Photooxidation of Polymers: Application to Dry-Developed Single-Layer Deep-UV Resists Kinetics of Polymer Etching in an Oxygen Glow Discharge Quantitative Analysis of a Laser Interferometer Waveform Obtained During Oxygen Reactive-Ion Etching of Thin Polymer Films Evaluation of Several Organic Materials as Planarizing Layers for Lithographic and Etchback Processing New Negative Deep-UV Resist for KrF Excimer Laser Lithography Characterization of a Thiosulfate Functionalized Polymer: A Water-Soluble Photosensitive Zwitterion Pyrimidine Derivatives as Lithographic Materials Synthesis of New Metal-Free Diazonium Salts and Their Applications to Microlithography Photobleaching Chemistry of Polymers Containing Anthracenes Lithography and Spectroscopy of Ultrathin Langmuir-Blodgett Polymer Films Dissolution of Phenolic Resins and Their Blends Solvent Concentration Profile of Poly(methyl methacrylate) Dissolving in Methyl Ethyl Ketone: A Fluorescence-Quenching Study Molecular Studies on Laser Ablation Processes of Polymeric Materials by Time-Resolved Luminescence Spectroscopy Mechanism of Polymer Photoablation Explored with a Quartz Crystal Microbalance Mechanism of UV- and VUV-Induced Etching of Poly(methyl methacrylate): Evidence for an Energy-Dependent Reaction
| Price | Condition | Delivery | Seller | Action |
| $169.03 | Digital |
| WonderClub |
Russell Clark
reviewed Polymers in Microlithography: Materials and Processes on December 25, 2015
Polymers in Microlithography: Materials and Processes
Not a bad textbook--but definitely not the best. The tables/figures are very helpful.
Login|Complaints|Blog|Games|Digital Media|Souls|Obituary|Contact Us|FAQ
CAN'T FIND WHAT YOU'RE LOOKING FOR? CLICK HERE!!! X
You must be logged in to add to WishlistX
This item is in your Wish List
X
This item is in your Collection
Polymers in Microlithography: Materials and Processes
X
This Item is in Your Inventory
Polymers in Microlithography: Materials and Processes
X
You must be logged in to review the productsX
X
X
Add Polymers in Microlithography: Materials and Processes, This volume examines the role polymeric materials play in the electronics industry, with special emphasis on recent advances in the science and technology of resist materials and processing for microlithography. It provides the reader with an appreci, Polymers in Microlithography: Materials and Processes to the inventory that you are selling on WonderClubX
X
Add Polymers in Microlithography: Materials and Processes, This volume examines the role polymeric materials play in the electronics industry, with special emphasis on recent advances in the science and technology of resist materials and processing for microlithography. It provides the reader with an appreci, Polymers in Microlithography: Materials and Processes to your collection on WonderClub |