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Preface
Part 1: Particle Detection/Analysis/Characterization and General Cleaning-Related Topics
Recent developments in imaging and analysis of micro- and nanosize particles and surface features
R. Kohli
Photodigital imaging as a means of monitoring particulate contamination on surfaces
R. Kaiser, J. Grilly and A. Kulczyk
Determination of residual particles on surfaces. An updated method for particle extraction using ultrasonics
S. B. Awad
Laser inactivation of surfaces and detection of bacteria
I. A. Watson, D. E. S. Stewart-Tull, R. Parton, I. Peden, A. Yeo, B. K. Tan and G. Ward
Laser-assisted nanofabrication on surfaces using micro- and nanoparticles
Y. F. Lu, L. P. Li, K. K. Mendu, J. Shi, D. W. Doerr and D. R. Alexander
Clean-then-assemble versus assemble-then-clean: Several comparisons
R. W. Welker
Development of a non-contact post-CMP cleaning process for copper
D. A. Koos, J. Svirchevski, D. J. Vitkavage, D. G. Hansen, K. A. Reinhardt, F. Huang, M. Mitchel and G. Zhang
Using ozonated DI water for pre-gate cleaning
L. Liu, I. Kashkoush, A. Walter and R. Novak
Decontamination of surrogate Pu-238 legacy wastes
R. Kaiser, J. Desrosiers and A. Kulczyk
Solar panel obscuration by dust and dust mitigation in the Martian atmosphere
M. K. Mazumder, A. S. Biris, C. E. Johnson, C. U. Yurteri, R. A. Sims, R. Sharma, K. Pruessner, S. Trigwell and J. S. Clements
Part 2: Particle Adhesion and Removal
Adhesion and friction of single micrometer-sized particles
M. Kappl, L. Heim, S. Ecke, M. Farshchi and H. J. Butt
The effect of laser-induced micro-roughness of textile fibers on adhesion and capture of micrometer-sized particles
T. Bahners, K. Opwis, T. Textor, W. Labuda and E. Schollmeyer
Advances in wafer cleaning and particle removal technology
K. A. Reinhardt
Particle removal challenges and solutions in semiconductor fabrication CMP processes
M. T. Andreas
Laser cleaning of model sub-micrometer particulate contaminants from Si surfaces
S. I. Kudryashov, S. D. Shukla and S. D. Allen
Removal of particles using the combined effect of laser-induced shock wave and explosive vaporization of liquid
D. Jang and D. Kim
Particle removal by attenuated total internal reflection of laser light
G. Dubé, A. J. Braundmeier, Jr. and J. D. Kelley
Removal of sub-100-nm particles from structured substrates with CO2 snow
J. C. J. van der Donck, R. Schmits, R. E. van Vliet and Ton (A.) G. T. M. Bastein
Particle removal by dense-phase fluids using ultrasonics
W. T. McDermott, G. Parris, D. V. Roth and C. J. Mammarella
Prediction of particle removal using surfactants
M. L. Free
Removal of micrometer-size particles from solid surfaces by an impinging air jet
K. Gotoh
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