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Computer Simulations of Electrochemical Interfaces (E. Spohr).
Time and Frequency Resolved Studies of Photoelectrochemical Kinetics (L. Peter & D. Vanmaekelbergh).
Chemical Deposition of Chalcogenide Thin Films from Solutions (D. Lincot, et al.).
Plasma Engineering (D. Economou).
Index.
| Price | Condition | Delivery | Seller | Action |
| $103.75 | Digital |
| WonderClub |
John M Rowehl
reviewed Advances in Electrochemical Science and Engineering on October 22, 2020 Advances in Electrochemical Science and Engineering
I just loved glancing through the book. I found William Callister very tough and confusing when i was recommended this book by my Prof.K.Murali. This book is a basic must read one for all who take up GATE Materials Science as it helps you to gain some knowledge apart from clearing the exam. Special mention must be made to the chapters on Mechanical Properties of Matter.
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Add Advances in Electrochemical Science and Engineering, Volume 6 in the well-establish series Advances in Electrochemical Science and Engineering covers - among others - such important topics as time dependent modulation techniques and computer modeling by continuum and non-continuum methods. As in al, Advances in Electrochemical Science and Engineering to the inventory that you are selling on WonderClubX
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Add Advances in Electrochemical Science and Engineering, Volume 6 in the well-establish series Advances in Electrochemical Science and Engineering covers - among others - such important topics as time dependent modulation techniques and computer modeling by continuum and non-continuum methods. As in al, Advances in Electrochemical Science and Engineering to your collection on WonderClub |
