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Charge Trapping Study of Hafnium-Based Gate Dielectrics for Advanced CMOS Technology. Book

Charge Trapping Study of Hafnium-Based Gate Dielectrics for Advanced CMOS Technology.
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Charge Trapping Study of Hafnium-Based Gate Dielectrics for Advanced CMOS Technology., , Charge Trapping Study of Hafnium-Based Gate Dielectrics for Advanced CMOS Technology.
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  • Charge Trapping Study of Hafnium-Based Gate Dielectrics for Advanced CMOS Technology.
  • Written by author Liyang Song
  • Published by , September 2011
Buy Digital  USD$99.99

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