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Polymeric Materials for Microelectronic Applications: Science and Technology Book

Polymeric Materials for Microelectronic Applications: Science and Technology
Polymeric Materials for Microelectronic Applications: Science and Technology, 
Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating mat, Polymeric Materials for Microelectronic Applications: Science and Technology has a rating of 2.5 stars
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Polymeric Materials for Microelectronic Applications: Science and Technology, Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating mat, Polymeric Materials for Microelectronic Applications: Science and Technology
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  • Polymeric Materials for Microelectronic Applications: Science and Technology
  • Written by author Hiroshi Ito
  • Published by An American Chemical Society Publication, January 1995
  • Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating mat
  • Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating material
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Authors

Preface
1Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids2
2Photochemistry of Liquid-Crystalline Polymers13
3Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study27
4Luminescence Study of Ion-Irradiated Aromatic Polymers45
5New Directions in the Design of Chemically Amplified Resists52
6Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration70
7Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists93
8Acid Generation in Chemically Amplified Resist Films110
9Radiation-Induced Reactions of Onium Salts in Novolak121
10Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography130
11Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanism of Triaryl Phosphate139
12Effect of Water on the Surface Insoluble Layer of Chemically Amplified Positive Resists151
13Thermal Properties of a Chemically Amplified Resist Resin165
14Modeling and Simulation of Chemically Amplified Resist Systems176
15Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer Interface185
16Surface Imaging for Applications to Sub-0.35-[mu]m Lithography201
17Molecular Design of Epoxy Resins for Microelectronics Packaging220
18Uniaxial and In-Plane Molecular Orientation of Polyimides and Their Precursor as Studied by Absorption Dichroism of Perylenebisimide Dye234
19Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as a Dissolution Inhibitor242
20Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polyimides253
21Waveguiding in High-Temperature-Stable Materials272
22Rodlike Fluorinated Polyimide as an In-Plane Birefringent Optical Material283
23Preparation of Polyphenylene and Copolymers for Microelectronics Applications298
24Charge-Carrier Generation and Migration in a Polydiacetylene Compound Studied by Pulse Radiolysis Time-Resolved Microwave Conductivity316
25Excitation Dynamics in Conjugated Polymers328
26Application of Polyaniline Films to Radiation Dosimetry336
27Present and Future of Fullerenes: C[subscript 60] and Tubules343
28Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components357
29Azimuthal Alignment Photocontrol of Liquid Crystals365
30Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains376
31Electronic Properties of Polysilanes387
32UV Photoelectron Spectroscopy of Polysilanes and Polygermanes
33Radical Ions of Polysilynes408
34Optical Properties of Silicon-Based Polymers with Different Backbone Structures425
35Synthesis and Properties of Polysilanes Prepared by Ring-Opening Polymerization433
36New Synthesis and Functionalization of Photosensitive Poly(silyl ether) by Addition Reaction of Bisepoxide with Dichlorosilane443
Author Index455
Affiliation Index456
Subject Index457


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Polymeric Materials for Microelectronic Applications: Science and Technology, 
Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating mat, Polymeric Materials for Microelectronic Applications: Science and Technology

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Polymeric Materials for Microelectronic Applications: Science and Technology, 
Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating mat, Polymeric Materials for Microelectronic Applications: Science and Technology

Polymeric Materials for Microelectronic Applications: Science and Technology

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Polymeric Materials for Microelectronic Applications: Science and Technology, 
Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating mat, Polymeric Materials for Microelectronic Applications: Science and Technology

Polymeric Materials for Microelectronic Applications: Science and Technology

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