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Copper : Fundamental Mechanisms for Microelectronic Applications Book

Copper : Fundamental Mechanisms for Microelectronic Applications
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Copper : Fundamental Mechanisms for Microelectronic Applications, A complete guide to the state of the art and future direction of copper interconnect technology Owing to its performance advantages, copper metallization for IC interconnect is attracting tremendous interest in the semiconductor community worldwide. This , Copper : Fundamental Mechanisms for Microelectronic Applications
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  • Copper : Fundamental Mechanisms for Microelectronic Applications
  • Written by author Shyam P. Murarka, Igor V. Verner, Ronald J. Gutmann
  • Published by Wiley-Blackwell, 2000/05/03
  • A complete guide to the state of the art and future direction of copper interconnect technology Owing to its performance advantages, copper metallization for IC interconnect is attracting tremendous interest in the semiconductor community worldwide. This
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Book Categories

Authors

Overview of IC Interconnects.

Behavior of Copper Impurity Atoms.

Copper-Related Defects in Silicon.

Chemistry and Electrochemistry.

Copper in Inorganic Dielectrics.

Copper in Organic Dielectrics (Polymers).

Diffusion and Compound Formation.

Layered Structures Containing Copper.

Copper for IC Metallization.

Future Directions in Copper Technology.

Appendix.

Index.


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Copper : Fundamental Mechanisms for Microelectronic Applications, A complete guide to the state of the art and future direction of copper interconnect technology Owing to its performance advantages, copper metallization for IC interconnect is attracting tremendous interest in the semiconductor community worldwide. This , Copper : Fundamental Mechanisms for Microelectronic Applications

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Copper : Fundamental Mechanisms for Microelectronic Applications, A complete guide to the state of the art and future direction of copper interconnect technology Owing to its performance advantages, copper metallization for IC interconnect is attracting tremendous interest in the semiconductor community worldwide. This , Copper : Fundamental Mechanisms for Microelectronic Applications

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Copper : Fundamental Mechanisms for Microelectronic Applications, A complete guide to the state of the art and future direction of copper interconnect technology Owing to its performance advantages, copper metallization for IC interconnect is attracting tremendous interest in the semiconductor community worldwide. This , Copper : Fundamental Mechanisms for Microelectronic Applications

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