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Principles of plasma discharges and materials processing Book

Principles of plasma discharges and materials processing
Principles of plasma discharges and materials processing, , Principles of plasma discharges and materials processing has a rating of 4.5 stars
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Principles of plasma discharges and materials processing, , Principles of plasma discharges and materials processing
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  • Principles of plasma discharges and materials processing
  • Written by author Michael A. Lieberman,Allan J. Lichtenberg
  • Published by New York : Wiley, c1994., 1994/11/29
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Systematically treats the basics of plasma physics and chemistry in partially ionized, chemically reactive, low-pressure plasmas. Offers an understanding of the wide diversity of plasma discharges and procedures used in thin film processing applications, as in the fabrication of integrated circuits. Includes scores of worked examples and exercises.


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