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Introduction | 1 | |
Pt. 1 | Foundation for Control | |
Ch. 1 | Process Control in the Semiconductor Industry | 15 |
Ch. 2 | Process Control and Optimization Methods for Run-to-Run Application | 45 |
Pt. 2 | R2R Control Algorithms | |
Ch. 3 | Basic R2R Control Algorithms | 67 |
Ch. 4 | Learning and Optimization Algorithms for an Optimizing Adaptive Quality Controller | 81 |
Ch. 5 | An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Processes | 91 |
Ch. 6 | A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry | 101 |
Pt. 3 | Integrating Control | |
Ch. 7 | Existing and Envisioned Control Environment for Semiconductor Manufacturing | 115 |
Ch. 8 | Design Requirements for an Integrative R2R Control Solution | 125 |
Ch. 9 | The Generic Cell Controller | 131 |
Ch. 10 | Derivation of a Piggyback Run-to-Run Control Solution Design | 165 |
Ch. 11 | Integrated Run-to-Run Control Solution Examples | 177 |
Ch. 12 | Design and Optimization of an Optimizing Adaptive Quality Controller, Generic Cell Controller Enabled Solution | 191 |
Pt. 4 | Customization Methodology | |
Ch. 13 | Case Study: Furnace Capability Improvement Using a Customized Run-to-Run Control Solution | 203 |
Ch. 14 | Process Recipe Optimization | 219 |
Pt. 5 | Case Studies | |
Ch. 15 | Multizone Uniformity Control of a CMP Process Utilizing a Pre- and Postmeasurement Strategy | 231 |
Ch. 16 | Control of Photolithography Alignment | 249 |
Ch. 17 | Age-Based Double EWMA Controller and Its Application to a CMP Process | 261 |
Pt. 6 | Advanced Topics | |
Ch. 18 | Advancements in Chemical Mechanical Planarization Process Automation and Control | 279 |
Ch. 19 | An Enhanced Exponentially Weighted Moving Average Controller for Processes Subject to Random Disturbances | 289 |
Ch. 20 | Enabling Generic Interprocess Multistep Control: the Active Controller | 309 |
Pt. 7 | Summary and Conclusions | 325 |
List of Acronyms | 335 | |
Index | 337 |
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Add Run-to-Run Control in Semiconductor Manufacturing, Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine runs, thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of, Run-to-Run Control in Semiconductor Manufacturing to the inventory that you are selling on WonderClubX
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Add Run-to-Run Control in Semiconductor Manufacturing, Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine runs, thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of, Run-to-Run Control in Semiconductor Manufacturing to your collection on WonderClub |